Fabrication of TiO2Thin Films Using UV-enhanced Atomic Layer Deposition at Room Temperature

A facile room temperature layer-by-layer deposition process for the fabrication of ultrathin films with noncentrosymmetrically oriented azobenzene chromophores.

Ultrathin films with noncentrosymmetrically orientated azobenzene chromophores were constructed using a combination of layer-by-layer adsorption of polyelectrolytes and the surface sol-gel process.

Enhanced free exciton and direct band-edge emissions at room temperature in ultrathin ZnO films grown on Si nanopillars by atomic layer deposition.

Room-temperature ultraviolet (UV) luminescence was investigated for the atomic layer deposited ZnO films grown on silicon nanopillars (Si-NPs) fabricated by self-masking dry etching in hydrogen-containing plasma. For films deposited at 200 °C, an intensive UV emission corresponding to free-exciton recombination (~3.31 eV) was observed with a nearly complete suppression of the defect-associated ...

Introduction to (plasma-enhanced) atomic layer deposition

Film growth by the atomic layer deposition (ALD) method relies on alternate pulsing of the precursor gases and vapors into a vacuum chamber and their subsequent chemisorption on the substrate surface (Fig. 1) [1,2]. The different steps in the process are saturative such that ALD film growth is self-limiting yielding one submonolayer of film per deposition cycle. ALD has some unique characterist...

Atomic layer deposition for fabrication of HfO2/Al2O3 thin films with high laser-induced damage thresholds

Previous research on the laser damage resistance of thin films deposited by atomic layer deposition (ALD) is rare. In this work, the ALD process for thin film generation was investigated using different process parameters such as various precursor types and pulse duration. The laser-induced damage threshold (LIDT) was measured as a key property for thin films used as laser system components. Re...

Review of plasma-enhanced atomic layer deposition: Technical enabler of nanoscale device fabrication